Modeling of heat transport and wafer heating effects during plasma etching

Journal of the Electrochemical Society

Volumn 143, Issue 11, 1996, Pages 3674-3680

  Tretheway, Derek ^a   Aydil, Eray S ^a,b  

^a University of California   (United States)

^b ELECTROCHEMICAL SOCIETY

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRODES; ENERGY TRANSFER; HEAT TRANSFER; HELIUM; ION BOMBARDMENT; MATHEMATICAL MODELS; PRESSURE EFFECTS; SILICON WAFERS; SUBSTRATES; THERMAL EFFECTS;

THERMAL CONTACT; WAFER EDGES; WAFER HEATING;

PLASMA ETCHING;

EID: 0030284314     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1837270     Document Type: Article

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