Fast three-dimensional simulation of buried EUV mask defect interaction with absorber features

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6730, Issue , 2007, Pages

  Clifford, Chris H ^a   Neureuther, Andrew R ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

Buried defect; Defect feature interaction; Defective multilayer; EUV mask; Fast simulation; FDTD; Ray tracing

Indexed keywords

DEFECT FEATURE INTERACTION; FAST SIMULATION; MASK ILLUMINATION;

COMPUTER SIMULATION; DEFECTS; EXTREME ULTRAVIOLET LITHOGRAPHY; FINITE DIFFERENCE TIME DOMAIN METHOD; LIGHT REFLECTION; RAY TRACING;

MASKS;

EID: 42149176856     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.746486     Document Type: Conference Paper

References (11)

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