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Volumn 3676, Issue II, 1999, Pages 587-597
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On the computation of reflected images from extreme ultra violet masks
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Author keywords
[No Author keywords available]
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Indexed keywords
COMPUTER SIMULATION;
MASKS;
OPTICAL MULTILAYERS;
REFLECTIVE COATINGS;
SEMICONDUCTOR DEVICE MANUFACTURE;
SUBSTRATES;
ULTRAVIOLET RADIATION;
EXTREME ULTRAVIOLET LITHOGRAPHY (EUVL);
REFLECTIVE MASKS;
PHOTOLITHOGRAPHY;
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EID: 0032662137
PISSN: 0277786X
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1117/12.351132 Document Type: Conference Paper |
Times cited : (9)
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References (10)
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