Fast simulation of buried EUV mask defect interaction with absorber features

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6517, Issue PART 1, 2007, Pages

  Clifford, Chris H ^a   Neureuther, Andrew R ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

Buried defect; Defective multilayer defect feature interaction; EUV mask; Fast simulation method; FDTD; Ray tracing

Indexed keywords

BURIED DEFECTS; DEFECTIVE MULTILAYER DEFECT FEATURE INTERACTION; FAST SIMULATION METHODS;

COMPUTER SIMULATION; DEFECTS; FINITE DIFFERENCE TIME DOMAIN METHOD; PRINTING; RAY TRACING;

MASKS;

ABSORBERS; DEFECTS; PRINTING; SIMULATION;

EID: 35148869616     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.711173     Document Type: Conference Paper

References (12)

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