Simulation of EUV multilayer mirror buried defects

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3997, Issue , 2000, Pages 799-806

  Brukman, Matthew ^a   Deng, Yunfei ^a   Neureuther, Andrew ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTATIONAL GEOMETRY; COMPUTER SIMULATION; CRYSTAL DEFECTS; ELECTROMAGNETISM; ETCHING; LIGHT REFRACTION; MASKS; MIRRORS; OPTICAL MULTILAYERS; PRINTING; SPUTTER DEPOSITION; ULTRAVIOLET RADIATION;

EXTREME ULTRAVIOLET LITHOGRAPHY (EUVL); PRINTABILITY;

PHOTOLITHOGRAPHY;

EID: 0033698636     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (9)