Impact of TiN post-treatment on metal insulator metal capacitor performances

Microelectronic Engineering

Volumn 83, Issue 11-12, 2006, Pages 2189-2194

  Bajolet, A ^a,b   Manceau, J P ^a,c   Bruyere S ^a   Clerc, R ^b   Proust, M ^a   Gaillard, N ^a   Giraudin, J C ^a   Delpech, P ^a   Montes L ^b   Ghibaudo, G ^b  

^a STMICROELECTRONICS   (France)

^b IMEP LAHC   (France)

^c LABORATOIRE D ELECTROTECHNIQUE DE GRENOBLE   (France)

Author keywords

EELS analysis; Electrical characteristics; MIM capacitors; TiN post treatment

Indexed keywords

ALUMINA; CAPACITORS; CHEMICAL VAPOR DEPOSITION; ELECTRIC PROPERTIES; INSULATING MATERIALS; PLASMA THEORY;

EELS ANALYSIS; MIM CAPACITORS; TIN POST-TREATMENT;

TITANIUM NITRIDE;

EID: 33751211242     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2006.10.004     Document Type: Article

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