Unusual thickness dependence of permittivity and elastic strain in Sc modified epitaxial (Ba,Sr) TiO3 thin films

Applied Physics Letters

Volumn 92, Issue 10, 2008, Pages

  Park, Woo Young ^a   Hwang, Cheol Seong ^a   Baniecki, John D ^b   Ishii, Masatoshi ^b   Kurihara, Kazuaki ^b   Yamanaka, Kazunori ^b  

^a Seoul National University   (South Korea)

^b FUJITSU LABORATORIES LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

FILM GROWTH; LATTICE CONSTANTS; PERMITTIVITY; STRAIN MEASUREMENT; TITANIUM COMPOUNDS;

CELL VOLUME; ELASTIC STRAIN; THICKNESS DEPENDENCE;

EPITAXIAL FILMS;

EID: 40849127012     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2883973     Document Type: Article

References (15)

1. J. D. Baniecki, T. Shioga, and K. Kurihara, Integr. Ferroelectr. IFEREU 1058-4587 10.1080/10584580215395 46, 221 (2002).
2. C. S. Hwang, S. O. Park, H.-J. Cho, C. S. Kang, H. K. Kang, S. I. Lee, and M. Y. Lee, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.114795 67, 2819 (1995).
3. J. M. Gregg, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.2385627 89, 196101 (2006).
4. N. A. Pertsev, R. Dittmann, R. Plonka, and R. Waser, J. Appl. Phys. JAPIAU 0021-8979 10.1063/1.2713934 101, 074102 (2007).
5. Z.-G. Ban and S. P. Alpay, J. Appl. Phys. JAPIAU 0021-8979 10.1063/1.1473675 91, 9288 (2002).
6. S. Ito and H. Funakubo, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.2719621 90, 142910 (2007).
7. W. Y. Park, K. H. Ahn, and C. S. Hwang, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.1629790 83, 4387 (2003).
8. R.-V. Wang, P. C. Mclntyre, J. D. Baniecki, K. Nomura, T. Shioga, K. Kurihara, and M. Ishii, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.2125113 87, 192906 (2005).
9. J. Wang and S. T. Mckinstry, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.2364127 89, 172906 (2006).
10. Y. Xia, C. Cai, X. Zhi, B. Pan, D. Wu, X. Meng, and Z. Liu, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.2201632 88, 182909 (2006).
11. J. S. Speck and W. Pompe, J. Appl. Phys. JAPIAU 0021-8979 10.1063/1.357097 76, 466 (1994).
12. Y. Tsur, A. Hitomi, I. Scrymgeour, and C. A. Randall, Jpn. J. Appl. Phys., Part 1 JAPNDE 0021-4922 10.1143/JJAP.40.255 40, 255 (2001).
13. Luke. S.-J. Peng, X. X. Xi, and Brian. H. Moeckly, Appl. Phys. Lett. 83, 4592 (2003).
14. G. A. Samara, Phys. Rev. PHRVAO 0031-899X 10.1103/PhysRev.151.378 151, 378 (1966).
15. D. Balzar, P. A. Ramakrishnan, and A. M. Herrmann, Phys. Rev. B PRBMDO 0163-1829 10.1103/PhysRevB.70.092103 70, 092103 (2004).