Microstructural and electrical properties of (BaxSr 1-x)Ti1+yO3+z thin films prepared by RF magnetron sputtering

Integrated Ferroelectrics

Volumn 46, Issue , 2002, Pages 221-232

  Baniecki, J D ^a   Shioga, T ^a   Kurihara, K ^a  

^a FUJITSU LABORATORIES LTD   (Japan)

Author keywords

BST; Low temperature; RF sputtering; SCL; Thin films

Indexed keywords

BARIUM COMPOUNDS; DEPOSITION; ELECTRIC POTENTIAL; ELECTRIC PROPERTIES; ELECTRODES; LEAKAGE CURRENTS; MAGNETIC PROPERTIES; MAGNETRON SPUTTERING; MICROSTRUCTURE; PERMITTIVITY; PLATINUM; POLYCRYSTALLINE MATERIALS; TITANIUM OXIDES;

APPLIED VOLTAGE; DEPOSITION TEMPERATURES; RF SPUTTERING;

FERROELECTRIC THIN FILMS;

EID: 2942652472     PISSN: 10584587     EISSN: 16078489     Source Type: Conference Proceeding    
DOI: 10.1080/10584580215395     Document Type: Article

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