Effect of the thermal expansion matching on the dielectric tunability of (100)-one-axis-oriented (Ba0.5 Sr0.5) Ti O3 thin films

Applied Physics Letters

Volumn 90, Issue 14, 2007, Pages

  Ito, Shinichi ^a   Funakubo, Hiroshi ^a   Koutsaroff, Ivoyl P ^b,c   Zelner, Marina ^b   Cervin Lawry, Andrew ^b  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

^b Gennum Corporation   (Canada)

^c MURATA MANUFACTURING CO LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL LATTICES; DIELECTRIC PROPERTIES; POLYCRYSTALLINE MATERIALS; THERMAL EXPANSION;

DIELECTRIC TUNABILITY; RESIDUAL THERMAL STRAINS; SURFACE NORMAL LATTICE SPACING;

THIN FILMS;

EID: 34047261788     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2719621     Document Type: Article

References (16)

1. C. Basceri, S. K. Streiffer, A. I. Kingon, and R. Waser, J. Appl. Phys. 82, 2497 (1997).
2. Y. A. Jeon, E. S. Choi, T. S. Seo, and S. G. Yoon, Appl. Phys. Lett. 79, 1012 (2001).
3. N. A. Pertsev, A. G. Zembilgotov, S. Hoffman, R. Waser, and A. K. Tagantsev, J. Appl. Phys. 85, 1698 (1999).
4. A. Sharma, Z.-G. Ban, S. P. Alpay, and J. V. Mantese, Appl. Phys. Lett. 85, 985 (2004).
5. T. R. Taylor, P. J. Hansen, B. Acikel, N. Pervers, R. A. York, S. K. Streiffer, and J. S. Speck, Appl. Phys. Lett. 80, 1978 (2002).
6. S. E. Moon, E.-K. Kim, M.-H. Kwak, H.-C. Ryu, Y.-T. Kim, K.-Y. Kang, S.-J. Lee, and W.-J. Kim, Appl. Phys. Lett. 83, 2166 (2003).
7. S. Ito, K. Takahashi, S. Okamoto, I. P. Koutsaroff, A. Cervin-Lawry, and H. Funakubo, Jpn. J. Appl. Phys., Part 1 44, 6881 (2005).
8. B. H. Park, E. J. Peterson, Q. X. Jia, J. Lee, X. Zeng, W. Si, and X. X. Xi, Appl. Phys. Lett. 78, 533 (2001).
9. S. Okamoto, S. Yokoyama, Y. Honda, G. Asano, and H. Funakubo, Jpn. J. Appl. Phys., Part 1 43, 6567 (2004).
10. K. Takahashi, M. Suzuki, T. Oikawa, H. Chen, and H. Funakubo, Mater. Res. Soc. Symp. Proc. 833, G1.9.1 (2005).
11. K. Takahashi, M. Suzuki, S. Okamoto, and H. Funakubo, Ceram. Trans. 174, 155 (2005).
12. M. Otsu, H. Funakubo, K. Shinozaki, and N. Mizutani, Trans. Mater. Res. Soc. Jpn. 14A, 1655 (1994).
13. A. Jiang, M. Dawber, J. F. Scott, C. Wang, P. Migliorato, and M. Gregg, Jpn. J. Appl. Phys., Part 1 42, 6973 (2003).
14. V. V. Lemanov, B. M. Goltsman, V. K. Yarmarkin, and Yu. A. Boikov, Ferroelectrics 286, 251 (2003).
15. X. H. Zhu, L. P. Yong, H. F. Tian, W. Peng, J. Q. Li, and D. N. Zheng, J. Phys.: Condens. Matter 18, 4709 (2006).
16. T. M. Shaw, Z. Suo, M. Huang, E. Liniger, R. B. Laibowitz, and J. D. Baniecki, Appl. Phys. Lett. 75, 2129 (1999).