Erratum: Application of the interface capacitance model to thin film relaxors and ferroelectrics (Applied Physics Letters (2006) 88 (262904))

Applied Physics Letters

Volumn 89, Issue 19, 2006, Pages

  Gregg, J M ^a  

^a QUEEN'S UNIVERSITY BELFAST   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 33750925758     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2385627     Document Type: Erratum

References (4)

1. M. Tyunina and J. Levoska, Appl. Phys. Lett. 88, 262904 (2006).
2. L. J. Sinnamon, R. M. Bowman, and J. M. Gregg, Appl. Phys. Lett. 78, 1724 (2001).
3. M. M. Saad, P. Baxter, J. McAneney, A. Lookman, L. J. Sinnamon, P. Evans, A. Schilling, T. Adams, X. Zhu, R. J. Pollard, R. M. Bowman, J. M. Gregg, P. Zubko, D. J. Jung, F. D. Morrison, and J. F. Scott, IEEE Trans. Ultrason. Ferroelectr. Freq. Control (in press).
4. J. McAneney, L. J. Sinnamon, R. M. Bowman, and J. M. Gregg, J. Appl. Phys. 94, 4566 (2003).