-
1
-
-
0031623825
-
-
ARMSCX 0084-6600 10.1146/annurev.matsci.28.1.79.
-
J. F. Scott, Annu. Rev. Mater. Sci. ARMSCX 0084-6600 10.1146/annurev. matsci.28.1.79 28, 79 (1998).
-
(1998)
Annu. Rev. Mater. Sci.
, vol.28
, pp. 79
-
-
Scott, J.F.1
-
2
-
-
0032606532
-
-
JAPIAU 0021-8979 10.1063/1.370759.
-
J. C. Shin, J. Park, C. S. Hwang, and H. J. Kim, J. Appl. Phys. JAPIAU 0021-8979 10.1063/1.370759 86, 506 (1999).
-
(1999)
J. Appl. Phys.
, vol.86
, pp. 506
-
-
Shin, J.C.1
Park, J.2
Hwang, C.S.3
Kim, H.J.4
-
3
-
-
18044402505
-
-
APPLAB 0003-6951 10.1063/1.1343499.
-
C. L. Chen, J. Shen, S. Y. Chen, G. P. Luo, C. W. Chu, F. A. Miranda, F. W. Van Keuls, J. C. Jiang, E. I. Meletis, and H. Y. Vhang, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.1343499 78, 652 (2001).
-
(2001)
Appl. Phys. Lett.
, vol.78
, pp. 652
-
-
Chen, C.L.1
Shen, J.2
Chen, S.Y.3
Luo, G.P.4
Chu, C.W.5
Miranda, F.A.6
Van Keuls, F.W.7
Jiang, J.C.8
Meletis, E.I.9
Vhang, H.Y.10
-
4
-
-
0036640583
-
-
JAPIAU 0021-8979 10.1063/1.1483105.
-
C. S. Hwang, J. Appl. Phys. JAPIAU 0021-8979 10.1063/1.1483105 92, 432 (2002).
-
(2002)
J. Appl. Phys.
, vol.92
, pp. 432
-
-
Hwang, C.S.1
-
5
-
-
79955982332
-
-
APPLAB 0003-6951 10.1063/1.1500413.
-
J. H. Chen, C. L. Lia, K. Urban, and C. L. Chen, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.1500413 81, 1291 (2002).
-
(2002)
Appl. Phys. Lett.
, vol.81
, pp. 1291
-
-
Chen, J.H.1
Lia, C.L.2
Urban, K.3
Chen, C.L.4
-
6
-
-
79956052123
-
-
APPLAB 0003-6951 10.1063/1.1469683.
-
Y. L. Qin, C. L. Jia, K. Urban, R. Liedtke, and R. Waser, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.1469683 80, 2728 (2002).
-
(2002)
Appl. Phys. Lett.
, vol.80
, pp. 2728
-
-
Qin, Y.L.1
Jia, C.L.2
Urban, K.3
Liedtke, R.4
Waser, R.5
-
7
-
-
23944461557
-
-
APPLAB 0003-6951 10.1063/1.2008372.
-
J. Q. He, E. Vasco, C. L. Jia, and R. H. Wang, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.2008372 87, 062901 (2005).
-
(2005)
Appl. Phys. Lett.
, vol.87
, pp. 062901
-
-
He, J.Q.1
Vasco, E.2
Jia, C.L.3
Wang, R.H.4
-
8
-
-
33645519760
-
-
APPLAB 0003-6951 10.1063/1.2191410.
-
S. Schmidt, D. O. Klenov, S. P. Keane, J. Lu, T. E. Mates, and S. Stemmer, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.2191410 88, 131914 (2006).
-
(2006)
Appl. Phys. Lett.
, vol.88
, pp. 131914
-
-
Schmidt, S.1
Klenov, D.O.2
Keane, S.P.3
Lu, J.4
Mates, T.E.5
Stemmer, S.6
-
9
-
-
79956001240
-
-
APPLAB 0003-6951 10.1063/1.1494837.
-
L. J. Sinnamon, M. M. Saad, R. M. Bowman, and J. M. Gregg, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.1494837 81, 703 (2002).
-
(2002)
Appl. Phys. Lett.
, vol.81
, pp. 703
-
-
Sinnamon, L.J.1
Saad, M.M.2
Bowman, R.M.3
Gregg, J.M.4
-
10
-
-
0040992761
-
-
APPLAB 0003-6951 10.1063/1.1340863.
-
B. H. Park, E. J. Peterson, Q. X. Jia, J. Lee, X. Zeng, W. Si, and X. X. Xi, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.1340863 78, 533 (2001).
-
(2001)
Appl. Phys. Lett.
, vol.78
, pp. 533
-
-
Park, B.H.1
Peterson, E.J.2
Jia, Q.X.3
Lee, J.4
Zeng, X.5
Si, W.6
Xi, X.X.7
-
11
-
-
0000263765
-
-
PRLTAO 0031-9007 10.1103/PhysRevLett.84.4625.
-
I. A. Akimov, A. A. Sirenko, A. M. Clark, J. H. Hao, and X. X. Xi, Phys. Rev. Lett. PRLTAO 0031-9007 10.1103/PhysRevLett.84.4625 84, 4625 (2000).
-
(2000)
Phys. Rev. Lett.
, vol.84
, pp. 4625
-
-
Akimov, I.A.1
Sirenko, A.A.2
Clark, A.M.3
Hao, J.H.4
Xi, X.X.5
-
13
-
-
0001264799
-
-
JAPIAU 0021-8979 10.1063/1.366147.
-
C. Zhou and D. M. Newns, J. Appl. Phys. JAPIAU 0021-8979 10.1063/1.366147 82, 3081 (1997).
-
(1997)
J. Appl. Phys.
, vol.82
, pp. 3081
-
-
Zhou, C.1
Newns, D.M.2
-
15
-
-
1242329839
-
-
APPLAB 0003-6951 10.1063/1.1644342.
-
B. Chen, H. Yang, L. Zhao, J. Miao, B. Xu, X. G. Qiu, B. R. Zhao, X. Y. Qi, and X. F. Duan, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.1644342 84, 583 (2004).
-
(2004)
Appl. Phys. Lett.
, vol.84
, pp. 583
-
-
Chen, B.1
Yang, H.2
Zhao, L.3
Miao, J.4
Xu, B.5
Qiu, X.G.6
Zhao, B.R.7
Qi, X.Y.8
Duan, X.F.9
-
16
-
-
0037960165
-
-
THSFAP 0040-6090 10.1016/S0040-6090(02)01330-5.
-
H. Z. Jin, J. Zhu, P. Ehrhart, F. Fitsilis, C. L. Jia, S. Regnery, K. Urban, and R. Waser, Thin Solid Films THSFAP 0040-6090 10.1016/S0040-6090(02) 01330-5 429, 282 (2003).
-
(2003)
Thin Solid Films
, vol.429
, pp. 282
-
-
Jin, H.Z.1
Zhu, J.2
Ehrhart, P.3
Fitsilis, F.4
Jia, C.L.5
Regnery, S.6
Urban, K.7
Waser, R.8
-
17
-
-
33749850301
-
-
NATUAS 0028-0836 10.1038/nature05148.
-
M. Stengel and N. A. Spaldin, Nature (London) NATUAS 0028-0836 10.1038/nature05148 443, 679 (2006).
-
(2006)
Nature (London)
, vol.443
, pp. 679
-
-
Stengel, M.1
Spaldin, N.A.2
-
18
-
-
0035309447
-
-
JCRGAE 0022-0248 10.1016/S0022-0248(01)00699-6.
-
D. C. Yoo and J. Y. Lee, J. Cryst. Growth JCRGAE 0022-0248 10.1016/S0022-0248(01)00699-6 224, 251 (2001).
-
(2001)
J. Cryst. Growth
, vol.224
, pp. 251
-
-
Yoo, D.C.1
Lee, J.Y.2
-
19
-
-
0037042606
-
-
JCPSA6 0021-9606 10.1063/1.1476322.
-
A. Asthagiri and D. S. Sholl, J. Chem. Phys. JCPSA6 0021-9606 10.1063/1.1476322 116, 9914 (2002).
-
(2002)
J. Chem. Phys.
, vol.116
, pp. 9914
-
-
Asthagiri, A.1
Sholl, D.S.2
-
20
-
-
0000854590
-
-
APPLAB 0003-6951 10.1063/1.125071.
-
H.-J. Gao, C. L. Chen, B. Rafferty, S. J. Pennycook, G. P. Luo, and C. W. Chu, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.125071 75, 2542 (1999).
-
(1999)
Appl. Phys. Lett.
, vol.75
, pp. 2542
-
-
Gao, H.-J.1
Chen, C.L.2
Rafferty, B.3
Pennycook, S.J.4
Luo, G.P.5
Chu, C.W.6
|