Growth of nano crystalline near α phase tantalum thin films at room temperature using cylindrical magnetron cathode

Surface and Coatings Technology

Volumn 202, Issue 14, 2008, Pages 3325-3331

  Valleti, Krishna ^a   Subrahmanyam, A ^a   Joshi, Shrikant V ^b  

^a INDIAN INSTITUTE OF TECHNOLOGY MADRAS   (India)

^b INTERNATIONAL ADVANCED RESEARCH CENTRE FOR POWDER METALLURGY AND NEW MATERIALS ARCI   (India)

Author keywords

Cylindrical magnetron; Nano indentation; Pulsed; Tantalum

Indexed keywords

COMPRESSIVE STRESS; ELECTRIC PROPERTIES; ELECTRON TEMPERATURE; NANOCRYSTALLINE MATERIALS; NANOINDENTATION; STRUCTURE (COMPOSITION); SURFACE MORPHOLOGY; THIN FILMS; VOLUME FRACTION;

CYLINDRICAL MAGNETRON CATHODE; PULSING POWER;

TANTALUM;

COMPRESSIVE STRESS; ELECTRIC PROPERTIES; ELECTRON TEMPERATURE; NANOCRYSTALLINE MATERIALS; NANOINDENTATION; STRUCTURE (COMPOSITION); SURFACE MORPHOLOGY; TANTALUM; THIN FILMS; VOLUME FRACTION;

EID: 40449112614     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2007.12.019     Document Type: Article

References (29)

1. Wuu D.S., Chan C.C., Horng R.H., Lin W.C., Chiu S.L., and Wu Y.Y. Appl. Sci. Lett. 144-145 (1999) 315
2. Yuan Z.L., Zhang D.H., Li C.Y., Prasad K., Tan C.M., and Tang L.J. Thin Solid Films 434 (2003) 126
3. McLean D.A., Schwartz N., and Tidd E.D. Proc. IEEE (1964) 1451
4. Kato H., and Kudo A. Catal. Let. 58 (1999) 153
5. Black J. Clin. Mater. 16 (1994) 167
6. Leng Y.X., Chen J.Y., Yang P., Sun H., Wang J., and Huang N. Nucl. Instrum. Methods Phys. Res., B Beam Interact. Mater. Atoms 242 (2006) 30
7. Matson D.W., McClanahan E.D., Rice J.P., Lee S.L., and Windover D. Surf. Coat. Technol. 133-134 (2000) 411
8. Cardarelli F., Taxil P., and Savall A. Int. J. Refract. Met. Hard Mater. 14 (1996) 365
9. Read M.H., and Altman C. Appl. Phys. Lett. 7 (1965) 51
10. Willmott D.J. J. Appl. Phys. 43 (1972) 4865
11. Subrahmanyam A., Valleti K., and Joshi S.V. J. Vac. Sci. Technol. A 25 (2007) 378
12. Liu L., Wang Y., and Gong H. J. Appl. Phys. 90 (2001) 416
13. Face D.W., and Prober D.E. J. Vac. Sci. Technol. A 5 (1987) 3408
14. Matson D.W., McClanahan E.D., Lee S.L., and Windover D. Surf. Coat. Technol. 146-147 (2001) 344
15. Clevenger L.A., Mutscheller A., Harper J.M.E., Cabral C., and Barmak K. J. Appl. Phys. 72 (1992) 4918
16. Roy R.A., Catania P., Saenger K.L., Cuomo J.J., and Lossy R.L. J. Vac. Sci. Technol. B 11 (1993) 1921
17. Cheng Y.H., Tay B.K., Lau S.P., Shi X., and Tan H.S. J. Vac. Sci. Technol. A 19 (2001) 2102
18. Senkevich J.J., Karabacak T., Bae D., and Cale T.S. J. Vac. Sci. Technol. B 24 (2006) 534
19. Diamand Y.S. J. Electron. Mater. 30 (2001) 336
20. Li D.J., Guruz M.U., and Chung Y.W. Appl. Phys. Lett. 81 (2002) 1113
21. Bradley, Backer H., Kelly P.J., and Arnell R.D. Surf. Coat. Technol. 135 (2001) 221
22. David N. Ruzic, Electric probes for low temperature plasmas, AVS Monograph Series (M-13).
23. Smith H.M.M., and Langmuir I. Phys. Rev. 28 (1926) 727
24. Kelly P.J., Onifade A.A., Zhou Y., Clarke G.C.B., Audronis M., and Bradley J.W. Plasma Processes Polym. 4 (2007) 246
25. Hirsch E.H., and Varga I.K. Thin Solid Films 69 (1980) 99
26. Window B., Sharples F., and Savvides N. J. Vac. Sci. Technol. A 6 (1988) 2333
27. JCPDS file No. 00-019-1290 (unpublished).
28. Kim H.S. Mater. Sci. Eng. 289 (2000) 30
29. B.D. Cullity, Elements of X-ray Diffraction, second ed., 139.