Formation of body-centered-cubic tantalum via sputtering on low- κ dielectrics at low temperatures

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 24, Issue 2, 2006, Pages 534-538

  Senkevich, Jay J ^a   Karabacak, Tansel ^b   Bae, Dae Lok ^c   Cale, Timothy S ^c  

^a BREWER SCIENCE INC   (United States)

^b Rensselaer Polytechnic Institute   (United States)

^c Rensselaer Polytechnic Institute   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BENZOCYCLOBUTENE (BCB); BODY-CENTERED-CUBIC; SPUTTERED TA FILMS;

DEPOSITION; DIELECTRIC MATERIALS; GRAIN SIZE AND SHAPE; HYDROCARBONS; POROUS MATERIALS; SPUTTERING; THIN FILMS;

TANTALUM;

EID: 33645520499     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2166860     Document Type: Article

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