Effect of arc suppression on the physical properties of low temperature dc magnetron sputtered tantalum thin films

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 25, Issue 2, 2007, Pages 378-382

  Subrahmanyam, A ^a   Valleti, Krishna ^a   Joshi, Srikant V ^b   Sundararajan, G ^b  

^a INDIAN INSTITUTE OF TECHNOLOGY MADRAS   (India)

^b INTERNATIONAL ADVANCED RESEARCH CENTRE FOR POWDER METALLURGY AND NEW MATERIALS ARCI   (India)

Author keywords

[No Author keywords available]

Indexed keywords

LOW TEMPERATURE EFFECTS; MAGNETRON SPUTTERING; PHYSICAL PROPERTIES; SINGLE CRYSTALS; STAINLESS STEEL; TANTALUM COMPOUNDS;

ARC SUPPRESSION; ARC-SUPPRESSION MODES;

THIN FILMS;

EID: 34248581293     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2699296     Document Type: Article

References (22)

1. A. Anders, Thin Solid Films 502, 22 (2006).
2. F. G. Tomasel, D. Carter, H. Walde, J. J. Gonzalez, G. McDonough, and G. A. Roche, Plasma Sources Sci. Technol. 12, 139 (2003).
3. S. L. Lee, M. Doxbeck, J. Mueller, M. Cipollo, and P. Cote, Surf. Coat. Technol. 177-178, 44 (2004).
4. L. Gladczuk, A. Patel, C. S. Paur, and M. Sosnowski, Thin Solid Films 467, 150 (2004).
5. A. Jiang, T. A. Tyson, L. Axe, L. Gladczuk, M. Sosnowski, and P. Cote, Thin Solid Films 479, 166 (2005).
6. P. N. Baker, Thin Solid Films 14, 3 (1972).
7. M. H. Rottersman and M. J. Bill, Thin Solid Films 61, 281 (1979).
8. D. J. Willmott, J. Appl. Phys. 43, 4865 (1972).
9. D. W. Face and D. E. Prober, J. Vac. Sci. Technol. A 5, 3408 (1987).
10. D. Gerstenberg and C. J. Calbick, J. Appl. Phys. 35, 402 (1964).
11. N. Waterhouse, P. S. Wilcox, and D. J. Willmott, J. Appl. Phys. 42, 5649 (1971).
12. Y. Danon, C. Lee, C. Mulligan, and G. Vigilante, IEEE Trans. Magn. 40, 1826 (2004).
13. JCPDS File No. 00-019-1290 (unpublished).
14. JCPDS File No. 00-002-1104 (unpublished).
15. M. Zhang, B. Yang, J. Chu, and T. G. Nieh, Scr. Mater. 54, 1227 (2006).
16. R. D. Arnell, P. J. Kelly, and J. W. Bradley, Surf. Coat. Technol. 188-189, 158 (2004).
17. J. W. Bradley, H. Backer, P. J. Kelly, and R. D. Arnell, Surf. Coat. Technol. 135, 221 (2001).
18. J.-W. Lee, S.-K. Tien, and Y.-C. Kuo, Thin Solid Films 494, 161 (2006).
19. S. D. Ekpe and S. K. Dew, J. Vac. Sci. Technol. A 20, 1877 (2002).
20. D. J. Ball, J. Appl. Phys. 43, 3047 (1972).
21. R. Wendt, K. Ellmer, and K. Wiesemann, J. Appl. Phys. 82, 2115 (1997).
22. M. Andritschky, F. Guimaraes, and V. Teixeira, Vacuum 44, 809 (1993).