Properties of thick sputtered Ta used for protective gun cobe coatings

Surface and Coatings Technology

Volumn 146-147, Issue , 2001, Pages 344-350

  Matson, Dean W ^a   McClanahan, Edwin D ^a   Lee, Sabrina L ^b   Windover, Donald ^b  

^a PACIFIC NORTHWEST NATIONAL LABORATORY   (United States)

^b Benet Laboratories   (United States)

Author keywords

Beta tantalum; High rate sputtering; Microstructure; Sputtering bias; Sputtering gas; Tantalum

Indexed keywords

HARDNESS; METALLOGRAPHIC MICROSTRUCTURE; OPTICAL MICROSCOPY; PROTECTIVE COATINGS; SPUTTERING; STEEL; SUBSTRATES; X RAY DIFFRACTION ANALYSIS;

PROTECTIVE GUN COBE COATINGS;

TANTALUM;

COATING; CORROSION RESISTANCE; GUN; MICROSTRUCTURE; SPUTTERING; TANTALUM;

EID: 0035465604     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(01)01402-5     Document Type: Article

References (15)