Effects of the restructuring of Fe catalyst films on chemical vapor deposition of carbon nanotubes

Surface and Coatings Technology

Volumn 202, Issue 14, 2008, Pages 3157-3163

  Liu, Huaping ^a,b   Cheng, Guo An ^a   Zheng, Ruiting ^a   Zhao, Yong ^a,c   Liang, Changlin ^a  

^a BEIJING UNIVERSITY OF POSTS AND TELECOMMUNICATIONS   (China)

^b TOKYO UNIVERSITY OF SCIENCE   (Japan)

^c NANCHANG UNIVERSITY   (China)

Author keywords

Carbon nanotubes; Chemical vapor deposition; Fe films; Restructuring

Indexed keywords

CARBON NANOTUBES; CHEMICAL VAPOR DEPOSITION; MORPHOLOGY; PARTICLE SIZE ANALYSIS; STRUCTURE (COMPOSITION); SYNTHESIS (CHEMICAL);

HIGH TEMPERATURE PROCESS; RESTRUCTURING;

IRON;

CARBON NANOTUBES; CHEMICAL VAPOR DEPOSITION; IRON; MORPHOLOGY; PARTICLE SIZE ANALYSIS; STRUCTURE (COMPOSITION); SYNTHESIS (CHEMICAL);

EID: 40449094175     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2007.11.020     Document Type: Article

References (39)

1. Iijima S. Nature 354 (1991) 56
2. Dai H. Surf. Sci. 500 (2002) 218
3. Thostenson E.T., Ren Z.F., and Chou T.W. Compos. Sci. Technol. 61 (2001) 1899
4. Terrones M. Annu. Rev. Mater. Res. 33 (2003) 419
5. Avouris P., Appenzeller J., Martel R., and Wind S.J. Proc. IEEE 91 (2003) 1772
6. Serp P., Corrias M., and Kalck P. Appl. Catal. A: General 253 (2003) 337
7. Choi J.H., Lee T.Y., Choi S.H., Han J.H., Yoo J.B., Park C.Y., Jung T., Yu S.G., Yi W., Han I.T., and Kim J.M. Thin Solid Film 435 (2003) 318
8. Moshkalyov S.A., Moreau A.L.D., Guttiérrez H.R., Cotta M.A., and Swart J.W. Mater. Sci. Eng. B 112 (2004) 147
9. Ren Z.F., Huang Z.P., Xu J.W., Wang J.H., Bush P., Siegal M.P., and Provencio P.N. Science 282 (1998) 1105
10. Zhang X.Y., Zhang L.D., Li G.H., and Zhao L.X. Sci. Eng. A 308 (2001) 9
11. Kim S.H., and Zachariah M.R. Mater. Lett. 61 (2007) 2079
12. Jeong G.H., Suzuki S., Kobayashi Y., Yamazaki A., Yoshimura H., and Homma Y. Appl. Phys. Lett. 90 (2007) 043108
13. Bartsch K., Arnold B., Kaltofen R., Täschner C., Thomas J., and Leonhardt A. Carbon 45 (2007) 543
14. Javey A., and Dai H. J. Am. Chem. Soc. 127 (2005) 11942
15. Melechko A.V., Merkulov V.I., McKnight T.E., Guillorn M.A., Klein K.L., Lowndes D.H., and Simpson M.L. J. Appl. Phys. 97 (2005) 041301
16. Lacerda R.G., Teo K.B.K., Teh A.S., Yang M.H., Dalal S.H., Jefferson D.A., Durrell J.H., Rupesinghe N.L., Roy D., Amaratunga G.A.J., Milne W.I., Wyczisk F., Legagneux P., and Chhowalla M. J. Appl. Phys. 96 (2004) 4456
17. Hafner J.H., Bronikowski M.J., Azamian B.R., Nikolaev P., Rinzler A.G., Colbert D.T., Smith K.A., and Smalley R.E. Chem. Phys. Lett. 296 (1998) 195
18. Li Cheung C., Kurtz A., Park H., and Lieber C.M. J. Phys. Chem. B106 (2002) 2429
19. Jiran E., and Thompson C.V. Thin Solid Films 208 (1992) 23
20. Wen J.M., Evans J.W., Bartelt M.C., Burnett J.W., and Thiel P.A. Phys. Rev. Lett. 76 (1996) 652
21. Liehr M., Lefakis H., Legoues F.K., and Rubloff G.W. Phys. Rev. B 33 (1986) 5517
22. Gadkari P.R., Warren A.P., Todi R.M., Petrova R.V., and Coffey K.R. J. Vac. Sci. Technol. A 23 (2005) 1152
23. Nerushev O.A., Dittmar S., Morjan R.-E., Rohmund F., and Campbell E.E.B. J. Appl. Phys. 93 (2003) 4185
24. de los arcos T., Garnier M.G., Seo J.W., Oelhafen P., Thommen V., and Mathys D. J. Phys. Chem. B 108 (2004) 7728
25. Liu H.P., Cheng G.A., Zhao Y., Zheng R.T., Liang C.L., Zhao F., and Zhang T.H. Surf. Coat. Technol. 201 (2006) 938
26. Jang Y.T., Ahn J.H., Lee Y.H., and Ju B.K. Chem. Phys. Lett. 372 (2003) 745
27. Hofmann S., Cantoro M., Kleinsorge B., Casiraghi C., Parvez A., Robertson J., and Ducati C. J. Appl. Phys. 98 (2005) 034308
28. Cantoro M., Hofmann S., Pisana S., Ducati C., Parvez A., Ferrari A.C., and Robertson J. Diam. Relat. Mater. 15 (2006) 1029
29. Pisana S., Cantoro M., Parvez A., Hofmann S., Ferrari A.C., and Robertson J. Physica E 37 (2007) 1
30. Wei Y.Y., Eres G., Merkulov V.I., and Lowndes D.H. Appl. Phys. Lett. 78 (2001) 1394
31. Egelhoff Jr. W.F., and Steigerwald D.A. J. Vac. Sci. Technol. A7 (1989) 2167
32. Darken L., and Gurry R. Physical Chemistry of Metals (1953), McGraw-Hill, New York 374
33. Merkulov V.I., Lowndes D.H., Wei Y.Y., Eres G., and Voelkl E. Appl. Phys. Lett. 76 (2000) 3555
34. Hansen P.L., Wagner J.B., Helveg S., Rostrup-Nielsen J.R., Clausen B.S., and Topsoe H. Science 295 (2002) 2053
35. Nishimaki K., Ohmae S., Yamamoto T.A., and Katsura M. Nanostruct. Mater. 12 (1999) 527
36. Thomann A.L., Salvetat J.P., Breton Y., Andreazza-Vignolle C., and Brault P. Thin Solid Films 428 (2003) 242
37. Mitchell C.E.J., Howard A., Carney M., and Egdell R.G. Surf. Sci. 490 (2001) 196
38. Peng D.L., Konno T.J., Wakoh K., Hihara T., and Sumiyama K. Eur. Phys. J., D 16 (2001) 329
39. Jung M., Eun K.Y., Baik Y.J., Lee K.R., Shin J.K., and Kim S.T. Thin Solid Films 398-399 (2001) 150