Density control of carbon nanotubes using NH3 plasma treatment of Ni catalyst layer

Thin Solid Films

Volumn 435, Issue 1-2, 2003, Pages 318-323

  Choi, Jong Hyung ^a   Lee, Tae Young ^a   Choi, Sun Hong ^a   Han, Jae Hee ^a   Yoo, Ji Beom ^a   Park, Chong Yun ^a   Jung, Taewon ^b   Yu, SeGi ^b   Yi, Whikun ^b   Han, In Taek ^b   Kim, J M ^b  

^a Sungkyunkwan University   (South Korea)

^b Samsung Advanced Institute of Technology (SAIT)   (South Korea)

Author keywords

Carbon nanotubes; Density control; NH3 plasma pre treatment; Ni nanoparticles

Indexed keywords

AMMONIA; CATALYSTS; DENSITY CONTROL (SPECIFIC GRAVITY); ELECTRON BEAM LITHOGRAPHY; ELECTRON EMISSION; MAGNETRON SPUTTERING; NICKEL; PHOTOLITHOGRAPHY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMA ETCHING; STRENGTH OF MATERIALS; THERMODYNAMIC STABILITY;

PLASMA TREATMENT;

CARBON NANOTUBES;

EID: 0037670223     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(03)00341-9     Document Type: Conference Paper

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