Carbon nanotubes growth by chemical vapor deposition using thin film nickel catalyst

Materials Science and Engineering: B

Volumn 112, Issue 2-3 SPEC. ISS., 2004, Pages 147-153

  Moshkalyov, S A ^a   Moreau, A L D ^a   Guttierrez H R ^a,b   Cotta, M A ^a   Swart, J W ^a  

^a UNIVERSITY OF CAMPINAS   (Brazil)

^b PENNSYLVANIA STATE UNIVERSITY   (United States)

Author keywords

Carbon nanotubes; Catalyst; Chemical vapor deposition; Nickel

Indexed keywords

ANNEALING; ATOMIC FORCE MICROSCOPY; CATALYSTS; NICKEL; NITROGEN; NUCLEATION; PARAMETER ESTIMATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SCANNING ELECTRON MICROSCOPY; SYNTHESIS (CHEMICAL); THIN FILMS;

ACETYLENE INJECTION; ELECTRON-BEAM DEPOSITION; LOAD-LOCK CHAMBER; THERMAL PROCESSING;

CARBON NANOTUBES;

EID: 4344591511     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mseb.2004.05.038     Document Type: Article

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