Thin-film metal catalyst for the production of multi-wall and single-wall carbon nanotubes

Journal of Applied Physics

Volumn 96, Issue 8, 2004, Pages 4456-4462

  Lacerda, R G ^a   Teo, K B K ^a   Teh, A S ^a   Yang, M H ^a   Dalal, S H ^a   Jefferson, D A ^a   Durrell, J H ^a   Rupesinghe, N L ^a   Roy, D ^a   Amaratunga, G A J ^a   Milne, W I ^a   Wyczisk, F ^b   Legagneux, P ^b   Chhowalla, M ^c  

^a UNIVERSITY OF CAMBRIDGE   (United Kingdom)

^b THALES RESEARCH AND TECHNOLOGY   (France)

^c RUTGERS UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

NANOAUGER SPECTROSCOPY; SINGLE-WALL CARBON NANOTUBES (SWCNT); SURFACE SENSITIVITY; THIN-FILM CATALYSTS;

ALUMINA; ANNEALING; ATOMIC FORCE MICROSCOPY; AUGER ELECTRON SPECTROSCOPY; CATALYSTS; CHEMICAL VAPOR DEPOSITION; IRON; NANOSTRUCTURED MATERIALS; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR GROWTH; SURFACE TREATMENT; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY;

CARBON NANOTUBES;

EID: 7544224693     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1794359     Document Type: Article

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