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Volumn 79, Issue 3, 2004, Pages 279-283

Atom lithography with two-dimensional optical masks

Author keywords

[No Author keywords available]

Indexed keywords

DIFFUSION; ELECTROMAGNETIC WAVE POLARIZATION; FABRICATION; HELIUM; HOLOGRAPHY; LITHOGRAPHY; MATHEMATICAL OPERATORS; PATTERN RECOGNITION;

EID: 4043083557     PISSN: 09462171     EISSN: None     Source Type: Journal    
DOI: 10.1007/s00340-004-1569-4     Document Type: Article
Times cited : (11)

References (25)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.