Nanolithography with metastable helium atoms in a high-power standing-wave light field

Applied Physics B: Lasers and Optics

Volumn 78, Issue 2, 2004, Pages 133-136

  Petra, S J H ^a   Feenstra, L ^a,b   Hogervorst, W ^a   Vassen, W ^a  

^a VU UNIVERSITY AMSTERDAM   (Netherlands)

^b UNIVERSITY OF HEIDELBERG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; ELECTROMAGNETIC WAVE DIFFRACTION; ETCHING; GROUND STATE; HELIUM; HYDROPHOBICITY; LASER BEAMS; MASKS; NANOSTRUCTURED MATERIALS;

ATOM LITHOGRAPHY; METASTABLE ATOMS; STANDING WAVE LIGHT FIELD;

NANOTECHNOLOGY;

EID: 1242352470     PISSN: 09462171     EISSN: None     Source Type: Journal    
DOI: 10.1007/s00340-003-1371-8     Document Type: Article

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