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Applied Physics B: Lasers and Optics

Volumn 77, Issue 4, 2003, Pages 415-419

Atom lithography with ytterbium beam

(3) Ohmukai, R a Urabe, S b Watanabe, M a

a NATIONAL INSTITUTE OF INFORMATION AND COMMUNICATIONS TECHNOLOGY (Japan)

b OSAKA UNIVERSITY (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; COHERENT LIGHT; ELECTRIC CONDUCTIVITY; OPTICS; YTTERBIUM;

ATOM LITHOGRAPHY; YTTERBIUM BEAM;

ELECTRON BEAM LITHOGRAPHY;

EID: 0142247423 PISSN: 09462171 EISSN: None Source Type: Journal
DOI: 10.1007/s00340-003-1281-9 Document Type: Article

Times cited : (56)

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