Nanometerscale lithography with chromium atoms using light forces

Microelectronic Engineering

Volumn 35, Issue 1-4, 1997, Pages 285-288

  Drodofsky, U ^b   Stuhler, J ^b   Brezger, B ^b   Schulze, Th ^b   Drewsen, M ^a,b   Pfau, T ^b   Mlynek, J ^b  

^a AARHUS UNIVERSITY   (Denmark)

^b UNIVERSITY OF KONSTANZ   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC BEAMS; ATOMS; CHROMIUM; LASER BEAMS; NANOTECHNOLOGY; SUBSTRATES;

NANOMETERSCALE STRUCTURES; OPTICAL STANDING WAVE;

LITHOGRAPHY;

EID: 0031069436     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(96)00116-5     Document Type: Article

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7. M. Drewsen, U. Drodofsky, Ch. Weber, G. Schreiber, and J. Mlynek, to be published in J. Phys. B.
8. U. Drodofsky et al., to be published.