A study on the chemical mechanical polishing of oxide film using a zirconia (ZrO2)-mixed abrasive slurry (MAS)

Microelectronic Engineering

Volumn 85, Issue 4, 2008, Pages 682-688

  Park, Sung Woo ^a   Seo, Yong Jin ^b   Lee, Woo Sun ^a  

^a Chosun University   (South Korea)

^b Daebul University   (South Korea)

Author keywords

Chemical mechanical polishing (CMP); Diluted silica slurry (DSS); Mixed abrasive slurry (MAS); Zirconia (ZrO2)

Indexed keywords

ABRASIVES; PARTICLE SIZE ANALYSIS; SURFACE MORPHOLOGY; ZIRCONIA;

CHEMICAL MECHANICAL POLISHING (CMP); DILUTED SILICA SLURRY (DSS); MIXED ABRASIVE SLURRY (MAS); SLURRY CONSUMPTION; ZIRCONIUM OXIDES;

SLURRIES;

EID: 40249092872     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2007.12.049     Document Type: Article

References (26)

1. Steigerwald J.M., Murarka S.P., Gutmann R.J., and Duquette D.J. Mater. Chem. Phys. 41 (1995) 217
2. Patrick W.J., Guthrie W.L., Standley C.L., and Schiable P.M. J. Electrochem. Soc. 138 (1991) 1778
3. Seo Y.J., Kim S.Y., and Lee W.S. J. Mater. Sci.: Mater. Electron. 12 (2001) 551
4. Kim S.Y., and Seo Y.J. Microelectron. Eng. 60 (2002) 357
5. Kamigata Y., Kurata Y., Masuda K., Amanokura J., Yoshida M., and Hanazono M. Mater. Res. Soc. Symp. Proc. 671 (2001) M13
6. Carpio R., Farkas J., and Jairath R. Thin Solid Films 266 (1995) 238
7. Yano H., Matsui Y., Minamihaba G., Kawahashi N., and Hattori M. Mater. Res. Soc. Symp. Proc. 671 (2001) M24
8. Y. Homma, T. Frusawa, K. Kusuka, M. Nagasawa, Y. Nakamura, M. Saitou, H. Moroshima, H. Sato, in: Proceedings of the Tenth International VLSI Multilevel Interconnection Conference, New York, USA, 1995, p. 457.
9. Y. Homma, T. Frusawa, K. Kusuka, M. Nagasawa, in: The Electrochemical Society Meeting, Abstract No. 597, Montreal, Quebec, Canada, May 4-9, 1998, p. 774.
10. D. Tower, M. Furry, in: Proceedings of Fifth International Chemical Mechanical Polishing Conference Symposium, Tokyo, Japan, 1998, p. 81.
11. Hara T., Kurosu T., and Doy T. Electrochem. Solid-State Lett. 4 (2001) G109
12. Hara T., Tomisawa T., Kurosu T., and Doy T. J. Electrochem. Soc. 146 (1999) 2333
13. Kishii S., Suzuki R., Ohishi A., and Arimoto Y. Tech. Dig. Int. Electron Dev. Meet (IEDM) (1995) 465
14. S.V. Babu, A. Jindal, S. Hegde, U.S. Pat. Appl. 2001.
15. Jindal A., Hegde S., and Babu S.V. Electrochem. Solid-State Lett. 5 (2002) G48
16. Seo Y.J., and Lee W.S. Microelectron. Eng. 75 (2004) 149
17. Seo Y.J., and Lee W.S. J. Kor. Phys. Soc. 48 (2006) 1651
18. S.W. Park, Y.J. Seo, S.J. Han, Y.K. Lee, W.S. Lee, in: Symposium D: Nano-Structured Materials and Devices, International Conference on Materials for Advanced Technologies (ICMAT), Abstract No.:D-7-PO129, (Singapore, July 1-6, 2007) (http://www.mrs.org.sg/conference/icmat2007/).
19. Seo Y.J. J. Korean Phys. Soc. 50 (2007) 700
20. Seo Y.J., Lee W.S., and Yeh P. Microelectron. Eng. 75 (2004) 361
21. Hayashi Y., Sakurai M., Nakajima T., and Hayashi K. Jpn. J. Appl. Phys. 34 (1995) 1037
22. Cook L.M. J. Non-Cryst. Solids 120 (1990) 152
23. Verwey E.J.W., and Overbeek J.Th.G. Theory of the Stability of Lyophobic Colloids (1948), Elsevier, Amsterdam
24. Seo Y.J., Kim G.U., and Lee W.S. Microelectron. Eng. 71 (2004) 209
25. Seo Y.J., Kim S.Y., and Lee W.S. Microelectron. Eng. 65 (2003) 371
26. Park S.W., Kim C.B., Kim S.Y., and Seo Y.J. Microelectron. Eng. 66 (2003) 488