Chemical mechanical polishing characteristics of barium titanate thin films using mixed abrasive slurry

Journal of the Korean Physical Society

Volumn 48, Issue 6, 2006, Pages 1651-1656

  Seo, Yong Jin ^a   Lee, Woo Sun ^b  

^a Daebul University   (South Korea)

^b Chosun University   (South Korea)

Author keywords

BaTiO 3; Chemical mechanical polishing; Dynamic random access memory; Mixed abrasive slurry; Removal rate; Within wafer non uniformity

Indexed keywords

EID: 33746066358     PISSN: 03744884     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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