Methodological study on the recycle of oxide-chemical mechanical polishing slurry

Journal of the Korean Physical Society

Volumn 50, Issue 3, 2007, Pages 700-707

  Seo, Yong Jin ^a  

^a Daebul University   (South Korea)

Author keywords

Chemical mechanical polishing (CMP); Diluted silica slurry (DSS); Mixed abrasive slurry (MAS); Mixing of original slurry (MOS); Recycle slurry; Removal rate (RR); Within wafer non uniformity (WIWNU)

Indexed keywords

EID: 34147137737     PISSN: 03744884     EISSN: None     Source Type: Journal    
DOI: 10.3938/jkps.50.700     Document Type: Article

References (15)

1. Y. J. Seo, S. Y. Kim and W. S. Lee, J. Mater. Sci.: Mater. Electron. 12, 551 (2001).
2. P. Sallagoity, F. Gaillard, M. Rivoire, M. Paoli and F. Martin, Microelectronic Reliability 38, 271 (1998).
3. H. G. Kang, T. Katoh, J. G. Park, U. Paik and H. S. Park, J. Korean Phys. Soc. 47, 705 (2005).
4. J. F. Luo and D. Dornfeld, in Proceeding of 18th International VLSI Multilevel Interconnection Conference (Santa Clara, CA, 2001), p. 281.
5. K. W. Chen, Y. L. Wang, C. P. Liu, Kevin Yang, L. Chang, K. Y. Lo and C. W. Liu, Thin Solid Films 447-448, 531 (2004).
6. Y. J. Seo, N. H. Kim and W. S. Lee, Electronics Lett. 40, 1553 (2004).
7. G. B. Basim, J. J. Adler, U. Mahajan, R. K. Singh and B. M. Moudgil, J. Electrochem. Soc. 147, 3523 (2000).
8. J. M. Steigerwald, S. P. Murarka and R. J. Gutmann, Chemical Mechanical Planarization of Microelectronic Materials (Wiley, New York, 1997).
9. Y. J. Seo and W. S. Lee, J. Korean Phys. Soc. 45, S618 (2004).
10. A. Jindal, S. Hegde and S. V. Babu, Electrochem. Solid-State Lett. 5, G48 (2002).
11. Y. J. Seo, Microelectron. Eng. 77, 263 (2005).
12. M. P. Monteith and N. Parekh, in Proceeding of Chemical Mechanical Planarization for ULSI Multilevel Interconnection Conference (Santa Clara, CA, 1997), p. 169.
13. Y. J. Seo and W. S. Lee, J. Korean Phys. Soc. 48, 1651 (2006).
14. G. C. C. Yang, T. Y. Yang and S. H. Tasi, Water Res. 37, 785 (2003).
15. S. W. Park, C. B. Kim, S. Y. Kim and Y. J. Seo, Microelectron. Eng. 66, 488 (2003).