메뉴 건너뛰기




Volumn 29, Issue 2, 2008, Pages 161-164

Dark-current suppression in metal-germanium-metal photodetectors through dopant-segregation in NiGe - Schottky barrier

Author keywords

Dark current; Dopant segregation (DS); Germanium; Optical communications; Photodetectors; Selective epitaxial

Indexed keywords

BANDWIDTH; DARK CURRENTS; DOPING (ADDITIVES); OPTICAL COMMUNICATION; SCHOTTKY BARRIER DIODES; SEMICONDUCTING GERMANIUM; SEMICONDUCTING SILICON;

EID: 39549113172     PISSN: 07413106     EISSN: None     Source Type: Journal    
DOI: 10.1109/LED.2007.914095     Document Type: Article
Times cited : (31)

References (17)
  • 3
    • 33847626559 scopus 로고    scopus 로고
    • Ultrathin low temperature SiGe buffer for the growth of high quality Ge epilayer on Si (1 0 0) by ultrahigh vacuum chemical vapor deposition
    • T. H. Loh, H. S. Nguyen, C. H. Tung, A. D. Trigg, G. Q. Lo, N. Balasubramanian, and D. L. Kwong, "Ultrathin low temperature SiGe buffer for the growth of high quality Ge epilayer on Si (1 0 0) by ultrahigh vacuum chemical vapor deposition," Appl. Phys. Lett., vol. 90, pp. 092108-1-092108-3, 2007.
    • (2007) Appl. Phys. Lett , vol.90
    • Loh, T.H.1    Nguyen, H.S.2    Tung, C.H.3    Trigg, A.D.4    Lo, G.Q.5    Balasubramanian, N.6    Kwong, D.L.7
  • 4
    • 0242334127 scopus 로고    scopus 로고
    • Effective dark current suppression with asymmetric MSM photodetectors in group IV semiconductors
    • Nov
    • C. O. Chui, A. K. Okyay, and K. C. Saraswat, "Effective dark current suppression with asymmetric MSM photodetectors in group IV semiconductors," IEEE Photon. Technol. Lett., vol. 15, no. 11, pp. 1585-1587, Nov. 2003.
    • (2003) IEEE Photon. Technol. Lett , vol.15 , Issue.11 , pp. 1585-1587
    • Chui, C.O.1    Okyay, A.K.2    Saraswat, K.C.3
  • 5
    • 1442287672 scopus 로고    scopus 로고
    • Metal germanium - metal photodetectors on heteroepitaxial Ge-on-Si with amorphous Ge schottky barrier enhancement layers
    • Feb
    • J. Oh, S. K. Banerjee, and J. C. Campbell, "Metal germanium - metal photodetectors on heteroepitaxial Ge-on-Si with amorphous Ge schottky barrier enhancement layers," IEEE Photon. Technol. Lett., vol. 16, pp. 581-583, Feb. 2004.
    • (2004) IEEE Photon. Technol. Lett , vol.16 , pp. 581-583
    • Oh, J.1    Banerjee, S.K.2    Campbell, J.C.3
  • 6
    • 32444431617 scopus 로고    scopus 로고
    • Leakage suppression by asymmetric area electrodes in metal semiconductor-metal photodetectors
    • A. K. Okyay, C. O. Chui, and K. C. Saraswat, "Leakage suppression by asymmetric area electrodes in metal semiconductor-metal photodetectors," Appl. Phys. Lett., vol. 88, pp. 063506-1-063506-2, 2006.
    • (2006) Appl. Phys. Lett , vol.88
    • Okyay, A.K.1    Chui, C.O.2    Saraswat, K.C.3
  • 7
    • 4544244783 scopus 로고    scopus 로고
    • Solution for high-performance Schottky-source/drain MOSFETs: Schottky barrier height engineering with dopant segregation technique
    • A. Kinoshita, Y. Tsuchiya, A. Yagishita, K. Uchida, and J. Koga, "Solution for high-performance Schottky-source/drain MOSFETs: Schottky barrier height engineering with dopant segregation technique," in VLSI Symp. Tech. Dig., 2004, pp. 168-169.
    • (2004) VLSI Symp. Tech. Dig , pp. 168-169
    • Kinoshita, A.1    Tsuchiya, Y.2    Yagishita, A.3    Uchida, K.4    Koga, J.5
  • 9
    • 33646154872 scopus 로고    scopus 로고
    • Modulation of NiGe/Ge Schottky barrier height by sulfur segregation during Ni germanidation
    • K. Ikeda, Y. Yamashita, and N. Sugiyama, "Modulation of NiGe/Ge Schottky barrier height by sulfur segregation during Ni germanidation," Appl. Phys. Lett., vol. 88, pp. 152115-1-152115-3, 2006.
    • (2006) Appl. Phys. Lett , vol.88
    • Ikeda, K.1    Yamashita, Y.2    Sugiyama, N.3
  • 10
    • 24344474484 scopus 로고    scopus 로고
    • Study of thermal stability of nickel monogermanide on single- and polycrystalline germanium substrates
    • S. L. Hsu, C. H. Chien, M. J. Yang, R. H. Huang, C. C. Leu, and S. W. Shen, "Study of thermal stability of nickel monogermanide on single- and polycrystalline germanium substrates," Appl. Phys. Lett., vol. 86, pp. 251906-1-251906-3, 2005.
    • (2005) Appl. Phys. Lett , vol.86
    • Hsu, S.L.1    Chien, C.H.2    Yang, M.J.3    Huang, R.H.4    Leu, C.C.5    Shen, S.W.6
  • 12
    • 0020824267 scopus 로고
    • The heteroepitaxy of Ge on Si (100) by vacuum evaporation
    • Sep
    • Y. Ohmachi, T. Nishioka, and Y. Shinoda, "The heteroepitaxy of Ge on Si (100) by vacuum evaporation," J. Appl. Phys., vol. 54, pp. 5466-5469, Sep. 1983.
    • (1983) J. Appl. Phys , vol.54 , pp. 5466-5469
    • Ohmachi, Y.1    Nishioka, T.2    Shinoda, Y.3
  • 14
    • 33750494545 scopus 로고    scopus 로고
    • High-efficiency metal-semiconductor-metal photodetectors on heteroepitaxially grown Ge on Si
    • Sep
    • A. K. Okyay, A. M. Nayfeh, and K. C. Saraswat, "High-efficiency metal-semiconductor-metal photodetectors on heteroepitaxially grown Ge on Si," Opt. Lett., vol. 31, pp. 2565-2567, Sep. 2006.
    • (2006) Opt. Lett , vol.31 , pp. 2565-2567
    • Okyay, A.K.1    Nayfeh, A.M.2    Saraswat, K.C.3
  • 15
    • 0001038612 scopus 로고    scopus 로고
    • Metal-semiconductor-metal near-infrared light detector based on epitaxial Ge/Si
    • Jun
    • L. Colace, G. Masini, F. Galluzzi, and G. Assanto, "Metal-semiconductor-metal near-infrared light detector based on epitaxial Ge/Si," Appl. Phys. Lett., vol. 72, pp. 3175-3177, Jun. 1998.
    • (1998) Appl. Phys. Lett , vol.72 , pp. 3175-3177
    • Colace, L.1    Masini, G.2    Galluzzi, F.3    Assanto, G.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.