Al 2 O 3 /SiO 2 films prepared by electron-beam evaporation as UV antireflection coatings on 4H-SiC

Applied Surface Science

Volumn 254, Issue 10, 2008, Pages 3045-3048

  Zhang, Feng ^a   Zhu, Huili ^a   Yang, Weifeng ^a   Wu, Zhengyun ^a   Qi, Hongji ^b   He, Hongbo ^b   Fan, Zhengxiu ^b   Shao, Jianda ^b  

^a XIAMEN UNIVERSITY   (China)

^b SHANGHAI INSTITUTE OF OPTICS AND FINE MECHANICS   (China)

Author keywords

4H SiC; Al 2 O 3 SiO 2 films; Electron beam evaporation; UV antireflection coatings

Indexed keywords

ADHESION; ALUMINUM COMPOUNDS; ELECTRON BEAMS; EVAPORATION; MICROSTRUCTURE; SCANNING ELECTRON MICROSCOPY; SILICON CARBIDE; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

ELECTRON BEAM EVAPORATION; SUBOXIDES;

ANTIREFLECTION COATINGS;

EID: 39549091485     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2007.10.052     Document Type: Article

References (17)

1. Wolborski M., Bakowski M., Ortiz A., Pore V., Schoner A., Ritala M., Leskela M., and Hallen A. Microelectron. Reliab. 46 (2006) 743
2. Avice M., Grossner U., Pintilie I., Svensson B.G., Nilsen O., and Fjellvag H. Appl. Phys. Lett. 89 (2006) 222103
3. Paskaleva A., Ciechonski R.R., Syvajarvi M., Atanassova E., and Yakimova R. J. Appl. Phys. 97 (2005) 124507
4. Rainer F., Lowdermilk H.W., Milam D., Carniglia C.K., Tuttle Hart T., and Lichtenstein T.L. Appl. Opt. 24 (1985) 496
5. Thielsch R., Gatto A., Heber J., and Kaiser N. Thin Solid Films 410 (2002) 86
6. Chen X.P., Yang W.F., and Wu Z.Y. Microelectron. Eng. 83 (2006) 104
7. Shang S.Z., Lei C., Hou H.H., Yi K., Fan Z.X., and Shao J.D. Appl. Surf. Sci. 242 (2005) 437
8. Harris G.L. Properties of Silicon Carbide (1995), INSPEC, UK
9. Macleod H.A. Thin-Film Optical Filters. third ed. (2001), Institute of Physics, London
10. Sochacki M., and Szmidt J. Thin Solid Films 446 (2004) 106
11. Tanner C.M., Sawkar-Mathur M., Lu J., Blom H.O., Toney M.F., and Chang J.P. Appl. Phys. Lett. 90 (2007) 061916
12. Jernigan G.G., Stahlbush R.E., Das M.K., Cooper J.A., and Lipkin L.A. Appl. Phys. Lett. 74 (1999) 1448
13. Hijikata Y., Yaguchi H., Yoshikawa M., and Yoshida S. Appl. Surf. Sci. 161 (2001) 184
14. Amy F., Soukiassian P., Hwu Y.K., and Brylinski C. Phys. Rev. B 65 (2002) 165323
15. Virojanadara C., and Johansson L.I. Phys. Rev. B 71 (2005) 195335
16. Schurmann M., Dreiner S., Berges U., and Westphal C. Phys. Rev. B 74 (2006) 035309
17. Knaup J.M., Deak P., Frauenheim T., Gali A., Hajnal Z., and Choyke W.J. Phys. Rev. B 71 (2005) 235321