Effect of N2 partial pressure on the growth of chromium nitride coatings

Metallurgia Italiana

Volumn 99, Issue 7-8, 2007, Pages 15-20

  Capotondi, F ^a   Rettighieri, L ^d   Ballestrazzi, A ^c   Calabri, L ^a   Ferrarini, P ^b   Menozzi, C ^a   Valeri, S ^d  

^a CNR INFM National Research Centre on Nanostructures and Biosystems at Surfaces (S3)

^b UNIVERSITY OF MODENA AND REGGIO EMILIA   (Italy)

^c IMAL Srl   (Italy)

^d CNR   (Italy)

Author keywords

AES; Chromium nitride; Reactive magnetron sputtering; Wear; XPS; XRD

Indexed keywords

CHROMIUM NITRIDE; GROWN FILMS; REACTIVE MAGNETRON SPUTTERING;

AUGER ELECTRON SPECTROSCOPY; CHARACTERIZATION; COATINGS; FILM GROWTH; MICROSTRUCTURE; NITRIDES; PARTIAL PRESSURE; SCANNING ELECTRON MICROSCOPY; X RAY DIFFRACTION;

CHROMIUM COMPOUNDS;

EID: 39349109774     PISSN: 00260843     EISSN: None     Source Type: Trade Journal    
DOI: None     Document Type: Article

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