Interface termination and band alignment of epitaxially grown alumina films on Cu-Al alloy

Journal of Applied Physics

Volumn 103, Issue 3, 2008, Pages

  Yoshitake, Michiko ^a   Song, Weijie ^a   Libra, Jiří ^b   Mašek, Karel ^b   Šutara, František ^b   Matolín, Vladimír ^b   Prince, Kevin C ^c  

^a NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

^b CHARLES UNIVERSITY   (Czech Republic)

^c SINCROTRONE TRIESTE   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

COPPER ALLOYS; CRYSTAL ATOMIC STRUCTURE; FILM GROWTH; PHOTOELECTRON SPECTROSCOPY;

BAND ALIGNMENT; INTERFACE TERMINATION;

ALUMINA;

EID: 39349107864     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2837116     Document Type: Article

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