Atomic scale study of the degradation mechanism of boron contaminated hafnium oxide

Applied Physics Letters

Volumn 92, Issue 5, 2008, Pages

  Sun, Qing Qing ^a   Dong, Lin ^a   Shi, Yu ^a   Liu, Han ^a   Ding, Shi Jin ^a   Zhang, David Wei ^a  

^a FUDAN UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

BORON; CONTAMINATION; DIELECTRIC MATERIALS;

ATOMIC SCALE STUDY; DEGRADATION MECHANISM;

HAFNIUM COMPOUNDS;

EID: 38949106119     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2841658     Document Type: Article

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