Thermal-hydrogen promoted selective desorption and enhanced mobility of adsorbed radicals in silicon film growth

Physical Review Letters

Volumn 100, Issue 4, 2008, Pages

  Cereda, S ^a   Zipoli, F ^a   Bernasconi, M ^a   Miglio, Leo ^a   Montalenti, F ^a  

^a UNIVERSITY OF MILANO BICOCCA   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; COMPUTER SIMULATION; DESORPTION; HYDROGEN; SILICON;

CAR-PARRINELLO SIMULATIONS; LOW-TEMPERATURE CONDITIONS; STATIC DENSITY;

EPITAXIAL GROWTH;

EID: 38849186585     PISSN: 00319007     EISSN: 10797114     Source Type: Journal    
DOI: 10.1103/PhysRevLett.100.046105     Document Type: Article

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