Stationary and non-stationary etching of Si(100) surfaces with gas phase and adsorbed hydrogen

Chemical Physics Letters

Volumn 320, Issue 5-6, 2000, Pages 405-410

  Dinger, A ^a   Lutterloh, C ^a   Kuppers J ^a,b  

^a UNIVERSITY OF BAYREUTH   (Germany)

^b MAX PLANCK INSTITUT FÜR PLASMAPHYSIK   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000766003     PISSN: 00092614     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0009-2614(00)00268-2     Document Type: Article

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