The influence of substrate polarity on the structural quality of InN layers grown by high-pressure chemical vapor deposition

Applied Physics Letters

Volumn 92, Issue 4, 2008, Pages

  Dietz, N ^a   Alevli, M ^a   Atalay, R ^a   Durkaya, G ^a   Collazo, R ^b   Tweedie, J ^b   Mita, S ^b   Sitar, Z ^b  

^a GEORGIA STATE UNIVERSITY   (United States)

^b North Carolina State University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHARGE CARRIERS; CHEMICAL VAPOR DEPOSITION; GALLIUM NITRIDE; IMPURITIES; INDIUM COMPOUNDS; X RAY DIFFRACTION;

FREE CARRIER CONCENTRATIONS; RAMAN MODE ANALYSIS; ROCKING CURVE ANALYSIS; SUBSTRATE POLARITY;

EPILAYERS;

EID: 38849156485     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2840192     Document Type: Article

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