An experimental study of charge distribution in crystalline and amorphous Si nanoclusters in thin silica films

Journal of Applied Physics

Volumn 103, Issue 2, 2008, Pages

  Thøgersen, Annett ^a   Diplas, Spyros ^a   Mayandi, Jeyanthinath ^a   Finstad, Terje ^a   Olsen, Arne ^a   Watts, John F ^b   Mitome, Masanori ^c   Bando, Yoshio ^c  

^a UNIVERSITY OF OSLO   (Norway)

^b UNIVERSITY OF SURREY   (United Kingdom)

^c NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; CHARGE DISTRIBUTION; CRYSTALLINE MATERIALS; ELECTRON ENERGY LOSS SPECTROSCOPY; SILICA; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY;

ELECTRON SCREENING; ELECTROSTATIC CHARGING; SILICON CORE HOLES;

NANOCLUSTERS;

EID: 38849123516     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2832630     Document Type: Article

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