Performance and quality analysis of Mo-Si multilayers formed by ion-beam and magnetron sputtering for extreme ultraviolet lithography

Thin Solid Films

Volumn 516, Issue 8, 2008, Pages 2050-2057

  Hiruma, Kenji ^a   Miyagaki, Shinji ^a   Yamanashi, Hiromasa ^a   Tanaka, Yuusuke ^a   Nishiyama, Iwao ^a  

^a ASSOCIATION OF SUPER ADVANCED ELECTRONICS TECHNOLOGIES ASET   (Japan)

Author keywords

Interfaces; Multilayers; Optical coatings; Sputtering

Indexed keywords

ION BEAMS; MAGNETRON SPUTTERING; MULTILAYERS; OPTICAL COATINGS; ULTRAVIOLET RADIATION;

ION BEAM SPUTTERING; REFLECTIVITY SPECTRUM;

MOLYBDENUM COMPOUNDS;

EID: 38649107377     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2007.07.182     Document Type: Article

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