Magnetic properties of Fe films deposited by Ar, Kr, and Xe ion beam sputtering

Journal of Applied Physics

Volumn 83, Issue 11, 1998, Pages 6667-6669

  Iwatsubo, S ^a   Takahashi, T ^a,b   Naoe, M ^a,c  

^a TOYAMA INDUSTRIAL TECHNOLOGY CENTER   (Japan)

^b UNIVERSITY OF TOYAMA   (Japan)

^c TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0141662950     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.367705     Document Type: Article

References (5)

1. A. Fukizawa and M. Naoe, IEEE Trans. Magn. MAG-23, 140 (1987).
2. M. Naoe, Y. Yamaga, and N. Terada, IEEE Trans. Magn. MAG-21, 1900 (1985).
3. N. Ishiwata, C. Wakabayashi, and T. Matsumoto, IEEE Trans. Magn. 24, 3078 (1988).
4. J. P. Biersack and W. Eckstein, Appl. Phys. A: Solids Surf. 34, 73 (1984).
5. R. D. Bland, G. J. Kominiak, and D. M. Mattox, J. Vac. Sci. Technol. 11, 671 (1974).