Surface morphology and growth mechanisms for sputtered amorphous silicon nitride thin films

Thin Solid Films

Volumn 516, Issue 8, 2008, Pages 1781-1787

  Yu, Lihua ^a,b   Xu, Junhua ^a   Dong, Shirun ^a   Kojima, Isao ^b  

^a JIANGSU UNIVERSITY OF SCIENCE AND TECHNOLOGY   (China)

^b NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

Amorphous Si3N4 films; Atomic force microscopy; One dimensional power spectral density analysis; Surface roughness

Indexed keywords

AMORPHOUS MATERIALS; ATOMIC FORCE MICROSCOPY; CRYSTAL GROWTH; SPECTRAL DENSITY; SURFACE MORPHOLOGY; SURFACE ROUGHNESS; THIN FILMS;

ANOMALOUS DYNAMIC SCALING; ONE DIMENSIONAL POWER SPECTRAL DENSITY ANALYSIS; SURFACE HEIGHT VARIATION;

SILICON NITRIDE;

EID: 38649105805     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2007.07.158     Document Type: Article

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