Surface evolution of nanostructured CrN and Si3N4 films

Journal of Applied Physics

Volumn 94, Issue 10, 2003, Pages 6827-6836

  Xu, Junhua ^a   Yu, Lihua ^a   Kojima, Isao ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CHROMIUM COMPOUNDS; COMPUTER SIMULATION; DIFFUSION; GRAIN GROWTH; HIGH RESOLUTION ELECTRON MICROSCOPY; MONTE CARLO METHODS; MULTILAYERS; NANOSTRUCTURED MATERIALS; SILICON NITRIDE; SURFACE PHENOMENA; SURFACE ROUGHNESS; TRANSMISSION ELECTRON MICROSCOPY;

FILM THICKNESS;

AMORPHOUS FILMS;

EID: 0345377529     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1617358     Document Type: Article

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