Measurement of photoacid generation kinetics in photoresist thin films via capacitance techniques

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5039 I, Issue , 2003, Pages 322-333

  Berger, Cody M ^a   Henderson, Clifford L ^a  

^a Georgia Institute of Technology   (United States)

Author keywords

Chemically amplified photoresist; Dielectric constant; Dill C parameter; Interdigitated electrodes

Indexed keywords

CAPACITANCE MEASUREMENT; COMPOSITION EFFECTS; ELECTRODES; ORGANIC ACIDS; PERMITTIVITY; POLYSTYRENES; RATE CONSTANTS; THIN FILMS;

CAPACITANCE TECHNIQUES; CHEMICALLY AMPLIFIED RESIST; INTERDIGITATED ELECTRODES; PHOTOACID GENERATION KINETICS; POLYHYDROXYSTYRENE MATRIX; TRIPHENYLSULFONIUM TRIFLATE;

PHOTORESISTS;

EID: 0141611752     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.485081     Document Type: Conference Paper

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