A study of acid diffusion in chemically amplified deep ultraviolet resist

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 14, Issue 6, 1996, Pages 4226-4228

  Itani, Toshiro ^a   Yoshino, Hiroshi ^a   Hashimoto, Shuichi ^a   Yamana, Mitsuharu ^a   Samoto, Norihiko ^a   Kasama, Kunihiko ^a  

^a NEC CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001291181     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.588580     Document Type: Article

References (11)

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