Real-time amine monitoring and its correlation to critical dimension control of chemically amplified resists for sub-0.25-μm geometries

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3333, Issue , 1998, Pages 924-930

  Conley, Will ^a   Babcock, Carl P ^a   Lilygren, John A ^a   Sandstrom, Clifford P ^a   Farrar, Nigel R ^b   Piatt, John ^c   Kinkead, Devon A ^c   Goodwin, William ^c   Kishkovich, Oleg P ^c   Higley, John K ^c   Cate, Phil ^c  

^a CYPRESS SEMICONDUCTOR   (United States)

^b HEWLETT PACKARD COMPANY   (United States)

^c Extraction Systems Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMINES; MICROMETERS; PHOTORESISTORS; PHOTORESISTS; THICKNESS MEASUREMENT; WINDOWS;

CD CONTROLS; CHEMICAL MONITORING; CHEMICALLY AMPLIFIED RESISTS; CONTAMINATION LEVELS; CRITICAL DIMENSION CONTROLS; CRITICAL DIMENSIONS; LINE-WIDTH CONTROLS; PROCESS WINDOWS;

DATA STORAGE EQUIPMENT;

EID: 0000271335     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.312479     Document Type: Conference Paper

References (5)

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2. R Allen, W. Conley , "Special Topics of Point Counterpoint on KrF vs ArF for 0.150mm", Semiconductor International, 20 (10), 72, 1998
3. S. MacDonald, N. Clecak, R. Wendt, U. Willson, C. Snyder, C. Knors, N. Deyoe, J. Maltabes, J. Morrow, A. McGuire and S. Holmes, Advances in Resist Technology and Processing VIII, H. Ito, ed., Proc. SPIE, 1466, 2-12 (1991).
4. W. Conley, R. Akkapeddi, J. Fahey, G. Hefferon, S. Holmes, G. Spinillo, J. Sturtevant, K. Welsh, Advances in Resist Technology XI, O. Nalamasu, ed., Proc. SPIE, 2195, 461-477 (1994).
5. Finle Technologies, Inc., Austin, TX 78716