메뉴 건너뛰기




Volumn 5376, Issue PART 1, 2004, Pages 533-540

Contact shrinkage techniques for 157-nm lithography

Author keywords

157 nm lithography; RELACS ; SAFIER ; Thermal flow

Indexed keywords

ADDITIVES; CROSSLINKING; FLUORINE CONTAINING POLYMERS; PHASE SHIFT; PROCESS CONTROL; SHRINKAGE;

EID: 3843142673     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.534596     Document Type: Conference Paper
Times cited : (3)

References (15)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.