Dissolution inhibitors for 157 nm photolithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5039 I, Issue , 2003, Pages 93-102

  Chambers, Charles R ^a   Kusumoto, Shiro ^a   Lee, GuenSu ^b   Vasudev, Alok ^a   Walthal, Leonidas ^a   Osborn, Brian P ^a   Zimmerman, Paul ^b   Conley, Willard E ^b   Willson, C Grant ^a  

^a UNIVERSITY OF TEXAS AT AUSTIN   (United States)

^b SEMATECH   (United States)

Author keywords

157 nm photoresist; DI; Dissolution inhibitor; PAG; Photo acid generator

Indexed keywords

ADDITION REACTIONS; CARBON MONOXIDE; DISSOLUTION; FLUORINE CONTAINING POLYMERS; FREE RADICALS; POLYMER BLENDS; POLYMERIZATION;

ACID LABILE PROTECTING GROUP; DISSOLUTION INHIBITORS; OPTICAL ABSORBANCE; PHOTOACID GENERATORS;

PHOTOLITHOGRAPHY;

EID: 0141723462     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.485191     Document Type: Conference Paper

References (5)

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