Novel fluoro copolymers for 157 nm photoresists-A progress report

Proceedings of SPIE-The International Society for Optical Engineering

Volumn 4690 I, Issue , 2002, Pages 41-50

  Hohle, Christoph ^a   Hien, Stefan ^b   Eschbaumer, Christian ^a   Rottstegge, Joerg ^a   Sebald, Michael ^a  

^a INFINEON TECHNOLOGIES AG   (Germany)

^b INFINEON TECHNOLOGIES   (United States)

Author keywords

157 nm; Absorbance; CARL; Cinnamic esters; Methacrylates; Photolithography; Thin film imaging; VUV

Indexed keywords

COPOLYMERIZATION; COPOLYMERS; DERIVATIVES; FLUORINE CONTAINING POLYMERS; OPTICAL RESOLVING POWER; SYNTHESIS (CHEMICAL);

FLUORO COPOLYMERS;

PHOTORESISTS;

EID: 0036028587     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.474252     Document Type: Article

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