Hexafluoroisopropyl and trifluoromethyl carbinols in an acrylate platform for 157-nm chemically amplified resists

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5376, Issue PART 1, 2004, Pages 554-564

  Jakubek, Vladimir ^a   Robertson III, Eric A ^b   Abdourazak, Atteye H ^b   Markley, Thomas J ^b   Marsella, John A ^b   Ober, Christopher K ^a  

^a School of Operations Research and Industrial Engineering   (United States)

^b AIR PRODUCTS AND CHEMICALS INC   (United States)

Author keywords

157 nm lithography; Chemical amplification; Fluorinated polymers; Hemiacetal; Hexafluoroisopropyl group

Indexed keywords

CHEMICAL AMPLIFICATION; HEMIACETALS; LITHOGRAPHIC IMAGING;

COPOLYMERS; DRY ETCHING; FLUORINE CONTAINING POLYMERS; HYDROCARBONS; IMAGING TECHNIQUES; MONOMERS; SURFACE ACTIVE AGENTS;

PHOTORESISTS;

EID: 3843106809     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.536586     Document Type: Conference Paper

References (22)

1. R. R. Kunz, T. M. Bloomstein, D. E. Hardy, R. B. Goodman, D. K. Downs, and J. E. Curtin J. Vac. Sci. Technol. B17, 3267 (1999).
2. R. R. Kunz, T. M. Bloomstein, D. E. Hardy, R. B. Goodman, D. K. Downs, and J. E. Curtin J. Photopolym. Sci & Technol. 12, 561 (1999).
3. Y. C. Bae, K. Douki, T. Yu, J. Dai, D. Schmaljohann, H. Koerner, C. K. Ober, W. Conley Chem. Mater. 14, 1306 (2002).
4. J. R. Gandler, W. P. Jencks J. Am. Chem. Soc. 104, 1937 (1982).
5. K. Przybilla, H. Roeschert, G. Pawlowski Proc. SPIE 1672, 500 (1992).
6. N. Fender, P. J. Brock, W. Cau, S. Bangsaruntip, A. Mahorowala, G. M. Wallraff, W. D. Hinsberg, C. E. Larson, H. Ito, G. Breyta, K. Burnham, H. Truong, P. Lawson, R. D. Allen Proc. SPIE 4345, 417 (2001).
7. V. R. Vohra, K. Douki, Y-J. Kwark, X-C. Liu, C. K. Ober, Y. C. Bae, W. Conley, D. Miller, P. Zimmerman Proc. SPIE 4690, 84 (2002).
8. V. Jakubek, X.-C. Liu, V. R. Vohra, K. Douki, Y-J. Kwark, T. J. Markley, E. A. Robertson III, V. C. Carr, J. A. Marsella, W. Conley, D. Miller, P. Zimmerman J. Photopolym. Sci & Technol. 16, 573 (2003).
9. H. Ito, H. D. Truong, M. Okazaki, R. A. DiPietro J. Photopolym. Sci. Technol. 16, 523 (2003).
10. A. L. Henne, P. E. Hinkamp J. Am. Chem. Soc., 76, 5147 (1954).
11. S. Resconich Ph.D. Thesis, Purdue University, 1961.
12. D. H. Campbell Ph,D. Thesis, Purdue University, 1955.
13. H. E. Simmons, D. W. Wiley J. Am. Chem. Soc., 82, 2288 (1960).
14. M. M. Dhingra, K. R. Tatta Org. Mag. Res, 9, 23 (1977).
15. T. J. Markley, J. A. Marsella, E. A. Robertson III, G. E. Parris, Z. Zarkov, V. Jakubek, C. K. Ober J. Vac. Sci. Technol. B 22, 140 (2004).
16. Y. C. Bae, K. Douki, T. Yu, J. Dai, D. Schmaljohann, S. H. Kang, K. H. Kim, H. Koerner, W. Conley, D. Miller, R. Balasubramanian, S. Holl, C. K. Ober J. Photopolym. Sci. Technol. 14, 613 (2001).
17. S. Ishikawa, S. Irie, T. Itani, Y. Kawaguchi, O. Yokokoji, S. Kodama Proc. SPIE 5039, 580 (2003).
18. M. Koh, T. Ishikawa, M. Toriumi, T. Araki, T. Yamashita, H. Aoyama, T. Yamazaki, T. Furukawa, T. Itani Proc. SPIE 5039, 589 (2003).
19. S. Kishimura, M. Endo, M. Sasago Proc. SPIE 4690, 200 (2002).
20. M. Koh, T. Ishikawa, T. Araki, H. Aoyama, T. Yamashita, T. Yamazaki, H. Watanabe, M. Toriumi, T. Itani Proc. SPIE 4690, 486 (2002).
21. F. A. Carey, R. J. Sundberg Advanced Organic Chemistry, Part A: Structure and Mechanism, 3rd ed.; Plenum Press: New York, (1990).
22. C. Hurd J. Chem. Educ. 43, 527, (1966).