Strategies for high transparency acrylate resists for 157 nm lithography

Journal of Photopolymer Science and Technology

Volumn 16, Issue 4, 2003, Pages 573-580

  Jakúbek, Vladimír ^a   Liu, Xiang Qian ^a   Vohra, Vaishali R ^a   Douki, Katsuji ^a   Kwark, Young Je ^a   Ober, Christopher K ^a   Markley, Thomas J ^b   Robertson III, Eric A ^b   Carr, Richard V C ^b   Marsella, John A ^b   Conley, Will ^c   Miller, Daniel ^c   Zimmerman, Paul ^c  

^a Cornell University   (United States)

^b AIR PRODUCTS AND CHEMICALS INC   (United States)

^c SEMATECH   (United States)

Author keywords

157 nm photoresist; Fluoropolymer; Hexafluoroisopropanol; Monofluoroacrylate; Silsesquioxanes; Trifluorovinyi monomer

Indexed keywords

1,3 CYCLOHEXANE; 2 ALLYLOXYMETHOXY 1,1,3,3,3 PENTAFLUOROPROPENE; 2 [4 (2 HYDROXYHEXAFLUOROISOPROPYL)CYCLOHEXANE]HEXAFLUOROISOPROPYL ALPHA MONOFLUOROACRYLATE; 2,2,3,4,4 PENTAFLUOROBUT 3 ENOIC ACID 3 METHYLBUT 2 ENYL ESTER; ACRYLIC ACID; ALICYCLIC COMPOUND; ALPHA FLUORO TERT BUTYLACRYLATE; COPOLYMER; DECALIN; DIPHENYL ETHER; FLUORINE DERIVATIVE; HEXANE; HYDROGEN; MONOMER; NORBORNENE HEXAFLUOROALCOHOL ALPHA FLUORO TERT BUTYLACRYLATE COPOLYMER; POLYMER; UNCLASSIFIED DRUG;

ABSORPTION; ARTICLE; CHEMICAL BOND; ELECTRON; FLUORINATION; HYDROGENATION; LITHOGRAPHY; PERFORMANCE; PHOTOCHEMISTRY; POLYMERIZATION; SYNTHESIS; TECHNOLOGY; TEMPERATURE;

EID: 0038168476     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.16.573     Document Type: Article

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