Wetting and dissolution studies of fluoropolymers used in 157 nm photolithography applications

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 22, Issue 1, 2004, Pages 140-145

  Markley, T J ^a   Marsella, J A ^a   Robertson III, E A ^a   Parris, G E ^a   Zarkov, Z ^a   Jakubek, V ^b   Ober, C K ^b  

^a AIR PRODUCTS AND CHEMICALS INC   (United States)

^b Cornell University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CONTACT ANGLE; CRYSTALS; DATA REDUCTION; DISSOLUTION; ELLIPSOMETRY; HYDROPHOBICITY; MONOMERS; PHOTOLITHOGRAPHY; PHOTORESISTS; QUARTZ; SOLUBILITY; SURFACE ACTIVE AGENTS; WETTING;

DISSOLUTION RATE; HYDROPHILIC GROUPS;

FLUORINE CONTAINING POLYMERS;

EID: 1642403429     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1637914     Document Type: Conference Paper

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