Performance of repaired defects and attPSM in EUV multilayer masks

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4889, Issue 1, 2002, Pages 418-425

  Deng, Yunfei ^a   La Fontaine, Bruno ^b   Neureuther, Andrew R ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

^b ADVANCED MICRO DEVICES   (United States)

Author keywords

Attenuated phase shifting masks; Buried defects; Defect imaging; Defect repair; EUV lithography; Non planar multilayer; Topography compaction; Topography removal

Indexed keywords

ATTENUATION; ELECTRON BEAMS; IMAGING TECHNIQUES; PHASE SHIFT; ULTRAVIOLET RADIATION;

DEFECT IMAGING;

MASKS;

EID: 0038303198     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.467896     Document Type: Conference Paper

References (9)

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