SCOPUS 정보 검색 플랫폼

Volumn 5376, Issue PART 1, 2004, Pages 625-632

PEB sensitivity variation of 193nm resist according to activation energy of protection groups

Author keywords

Acid diffusion controller; Activation energy for deprotecting reactions; ArF resist; Diffusivity of quencher; PEB sensitivity

Indexed keywords

ACIDITY; DIFFUSION; HYDROPHILICITY; PERTURBATION TECHNIQUES; PHOTORESISTS; QUENCHING; STIFFNESS;

ACID DIFFUSION CONTROLLER; ACTIVATION ENERGY FOR DEPROTECTING REACTIONS; ARF RESISTS; DIFFUSIVITY OF QUENCHER; PEB SENSITIVITY;

ACTIVATION ENERGY;

EID: 3843081723 PISSN: 0277786X EISSN: None Source Type: Conference Proceeding
DOI: 10.1117/12.534665 Document Type: Conference Paper

Times cited : (3)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.